Dr. David O. Melville
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 5 April 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Diffraction, Visualization, Photomasks, Source mask optimization, Algorithm development, Standards development, Resolution enhancement technologies

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Image processing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers, Tolerancing, Resolution enhancement technologies

Proceedings Article | 16 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffractive optical elements, Metals, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Line edge roughness, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Radon, Manufacturing, 3D printing, Printing, Photomasks, Photoresist processing, Tolerancing, Binary data, 3D image processing

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Diffraction, Optical lithography, Lithographic illumination, Manufacturing, Printing, Photomasks, Source mask optimization, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 12 publications
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