David S. Mui
Technologist at Applied Materials Inc
SPIE Involvement:
Publications (5)

Proceedings Article | 29 April 2004 Paper
David Mui, Hiroki Sasano, Wei Liu, John Yamartino, Andrew Skumanich
Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.537444
KEYWORDS: Etching, Semiconducting wafers, Process control, Metrology, Critical dimension metrology, Scatterometry, Data modeling, Optical lithography, Feedback loops, Control systems

Proceedings Article | 26 June 2003 Paper
Wei Liu, David Mui, Thorston Lill, May Wang, Christopher Bencher, Michael Kwan, Wendy Yeh, Takeaki Ebihara, Toshihiro Oga
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485532
KEYWORDS: Etching, Carbon, Photoresist materials, Lithography, Photomasks, 193nm lithography, Critical dimension metrology, Reflectivity, Antireflective coatings, Optical lithography

Proceedings Article | 16 July 2002 Paper
Weidong Yang, Roger Lowe-Webb, Rahul Korlahalli, Vera Zhuang, Hiroki Sasano, Wei Liu, David Mui
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473425
KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Photoresist materials, Diffraction gratings, Diffraction, Reflectivity, Finite element methods, Spectroscopy, Polarizers

Proceedings Article | 11 June 1999 Paper
Carol Lee, Dian Sugiarto, Ling Liao, David Mui, Timothy Weidman, Michael Nault, Tony Tryba
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350216
KEYWORDS: Etching, Line edge roughness, Plasma, Lithography, Chemical vapor deposition, Polymers, Photomasks, Critical dimension metrology, 193nm lithography, Oxidation

Proceedings Article | 29 June 1998 Paper
Carol Lee, Siddhartha Das, John Yang, Timothy Weidman, Dian Sugiarto, Michael Nault, David Mui, Zoe Osborne
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312392
KEYWORDS: Line edge roughness, Plasma, Etching, Refractive index, Chemical vapor deposition, Lithography, Plasma etching, Oxides, Semiconducting wafers, Photoresist processing

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