David S. Mui
Technologist at Applied Materials Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 29 April 2004 Paper
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Metrology, Optical lithography, Data modeling, Etching, Control systems, Scatterometry, Process control, Feedback loops, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 June 2003 Paper
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Carbon, Lithography, Antireflective coatings, Optical lithography, Etching, Reflectivity, Photoresist materials, Photomasks, Critical dimension metrology, 193nm lithography

Proceedings Article | 16 July 2002 Paper
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Diffraction, Spectroscopy, Reflectivity, Polarizers, Scanning electron microscopy, Photoresist materials, Finite element methods, Critical dimension metrology, Semiconducting wafers, Diffraction gratings

Proceedings Article | 11 June 1999 Paper
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Lithography, Etching, Polymers, Chemical vapor deposition, Photomasks, Critical dimension metrology, Line edge roughness, 193nm lithography, Plasma, Oxidation

Proceedings Article | 29 June 1998 Paper
Proc. SPIE. 3333, Advances in Resist Technology and Processing XV
KEYWORDS: Oxides, Lithography, Refractive index, Etching, Chemical vapor deposition, Plasma etching, Line edge roughness, Photoresist processing, Semiconducting wafers, Plasma

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