David W. Myers
Vice President EUV Development at Cymer LLC
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Light sources, Deep ultraviolet, Scanners, Hydrogen, Laser applications, Laser development, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Proceedings Article | 18 March 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Mirrors, Scanners, Reflectivity, Control systems, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Tin

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Scanners, Carbon dioxide lasers, Laser scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma systems, Plasma, Tin

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Light sources, Metrology, Optical lithography, Laser development, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Plasma, Tin

SPIE Journal Paper | 29 June 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

Showing 5 of 25 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top