David E. Noga
Grad Student at Georgia Institute of Technology
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Thin films, Lithography, Electron beam lithography, Molecules, Silicon, Chemistry, Scanning electron microscopy, Photoresist materials, Head-mounted displays, Standards development

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Electron beam lithography, FT-IR spectroscopy, Optical lithography, Deep ultraviolet, Polymers, Molecules, Image resolution, Solids, Line edge roughness

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Thin films, Optical lithography, Quartz, Polymers, Crystals, Silicon, Chemistry, Silicon films, Semiconducting wafers, Polymer thin films

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Thin films, Lithography, Electron beam lithography, Capillaries, Chemistry, Scanning electron microscopy, Photoresist materials, Line edge roughness, Photoresist processing, Liquids

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Electron beam lithography, Optical lithography, Deep ultraviolet, Polymers, Glasses, Dewetting, Molecules, Scanning electron microscopy, Polymerization, Line edge roughness

SPIE Journal Paper | October 1, 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Deep ultraviolet, Absorbance, Polymers, Energy efficiency, Photons, Electron beams, Spectroscopic ellipsometry, Extreme ultraviolet, Refractive index, Absorption

Showing 5 of 8 publications
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