Dr. David Rio
at imec
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 13 October 2020 Poster + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Process modeling, Extreme ultraviolet, Semiconducting wafers, Metrology, Calibration, Finite element methods

Proceedings Article | 3 October 2018 Presentation + Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Source mask optimization, Semiconducting wafers, Scanners, Logic, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet

Proceedings Article | 22 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Data modeling, Calibration, Optical proximity correction, Scanning electron microscopy, Image processing, Time metrology, Critical dimension metrology, Semiconducting wafers, Error analysis

Proceedings Article | 21 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Etching, Tin, SRAF, Optical lithography, Logic, Extreme ultraviolet, Photomasks, Stochastic processes, Scanning electron microscopy, Photoresist processing

Proceedings Article | 16 October 2017 Presentation + Paper
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Etching, Optical proximity correction, Stochastic processes, Critical dimension metrology, Extreme ultraviolet, Metrology, Photoresist processing, Performance modeling, Error analysis

Showing 5 of 15 publications
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