Dr. David Rio
at imec
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Reticles, Logic, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Semiconducting wafers

Proceedings Article | 22 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Error analysis, Scanning electron microscopy, Time metrology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 21 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Logic, Optical lithography, Etching, Scanning electron microscopy, Photomasks, Extreme ultraviolet, SRAF, Photoresist processing, Stochastic processes, Tin

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Metrology, Etching, Error analysis, Extreme ultraviolet, Optical proximity correction, Critical dimension metrology, Photoresist processing, Stochastic processes, Performance modeling

Proceedings Article | 28 April 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Signal to noise ratio, Metrology, Optical lithography, Data modeling, Calibration, Metals, Image analysis, Optical proximity correction, OLE for process control, Instrument modeling

Showing 5 of 14 publications
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