Mr. David J. Siefers
Applications Manager at
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Neck, Quartz, Manufacturing, Magnetism, Distortion, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Phase shifts

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