David J. Siefers
Applications Manager
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Neck, Quartz, Manufacturing, Magnetism, Distortion, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Phase shifts

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