David Tien
Product Marketing Director at FEI Co
SPIE Involvement:
Author
Publications (28)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Target detection, Semiconductors, Optical filters, Metrology, Detection and tracking algorithms, Calibration, Inspection, Scanning electron microscopy, Precision measurement, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Mathematical modeling, Data modeling, Scanners, Zernike polynomials, Process control, Feedback control, Semiconducting wafers, Statistical modeling, Performance modeling, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Diffraction, Metrology, Calibration, Scanners, Scatterometry, Finite element methods, Photomasks, Semiconducting wafers, Phase shifts

SPIE Journal Paper | December 2, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Overlay metrology, Calibration, Optical filters, Etching, Semiconducting wafers, Detection and tracking algorithms, Polishing, Chemical vapor deposition, Chemical mechanical planarization

SPIE Journal Paper | October 6, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Overlay metrology, Calibration, Optical testing, Etching, Inspection, Scanning electron microscopy, Imaging metrology, Electron microscopes, Measurement devices

PROCEEDINGS ARTICLE | April 21, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Optical filters, Polishing, Metrology, Detection and tracking algorithms, Calibration, Etching, Computer simulations, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Showing 5 of 28 publications
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