Mr. David Trost
at
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 11, 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Optical lithography, Photomasks, Optical proximity correction, Raster graphics, Photoresist processing, Model-based design, Edge roughness

PROCEEDINGS ARTICLE | January 22, 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Modulation, Composites, Control systems, Photomasks, Optical proximity correction, Raster graphics, Binary data, RGB color model

PROCEEDINGS ARTICLE | July 21, 2000
Proc. SPIE. 3997, Emerging Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Reticles, Modulation, Scattering, Control systems, Photomasks, Raster graphics, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | July 21, 2000
Proc. SPIE. 3997, Emerging Lithographic Technologies IV
KEYWORDS: Carbon, Lithography, Electron beam lithography, Reticles, Metals, Composites, Interfaces, Manufacturing, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | July 19, 2000
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Lithography, Electron beam lithography, Reticles, Control systems, Photomasks, Raster graphics, Critical dimension metrology, Line edge roughness, Binary data, RGB color model

PROCEEDINGS ARTICLE | July 5, 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Superposition, Electron beam lithography, Optical lithography, Data modeling, Distortion, Computer simulations, Photomasks, Thermal modeling, Systems modeling, Astatine

Showing 5 of 9 publications
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