David Trost
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 11 March 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Optical lithography, Photomasks, Optical proximity correction, Raster graphics, Photoresist processing, Model-based design, Edge roughness

Proceedings Article | 22 January 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Modulation, Composites, Control systems, Photomasks, Optical proximity correction, Raster graphics, Binary data, RGB color model

Proceedings Article | 21 July 2000
Proc. SPIE. 3997, Emerging Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Reticles, Modulation, Scattering, Control systems, Photomasks, Raster graphics, Critical dimension metrology, Photoresist processing

Proceedings Article | 21 July 2000
Proc. SPIE. 3997, Emerging Lithographic Technologies IV
KEYWORDS: Carbon, Lithography, Electron beam lithography, Reticles, Metals, Composites, Interfaces, Manufacturing, Photomasks, Semiconducting wafers

Proceedings Article | 19 July 2000
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Lithography, Electron beam lithography, Reticles, Control systems, Photomasks, Raster graphics, Critical dimension metrology, Line edge roughness, Binary data, RGB color model

Showing 5 of 9 publications
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