Dr. David Van Steenwinckel
Senior Scientist at NXP Semiconductors
SPIE Involvement:
Publications (13)

SPIE Journal Paper | 1 April 2008
David Van Steenwinckel, Roel Gronheid, Jeroen Lammers, Frieda Van Roey, Patrick Willems
JM3, Vol. 7, Issue 02, 023002, (April 2008) https://doi.org/10.1117/12.10.1117/1.2909204
KEYWORDS: Line width roughness, Nanoimprint lithography, Electroluminescence, Diffusion, Photoresist materials, Absorbance, Extreme ultraviolet, Lithography, Photoresist processing, Extreme ultraviolet lithography

Proceedings Article | 28 March 2008 Paper
Proceedings Volume 6921, 69211T (2008) https://doi.org/10.1117/12.771971
KEYWORDS: Semiconducting wafers, Scattering, Silicon, Critical dimension metrology, Electron beam lithography, Laser scattering, Lenses, Lithography, Modulation transfer functions, Maskless lithography

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65202F (2007) https://doi.org/10.1117/12.713914
KEYWORDS: Double patterning technology, Etching, Thin film coatings, Line edge roughness, Lithography, Photomasks, Optical lithography, Phase shifts, Critical dimension metrology, Photoresist processing

Proceedings Article | 21 March 2007 Paper
D. Van Steenwinckel, R. Gronheid, J. Lammers, A. Meyers, F. Van Roey, P. Willems
Proceedings Volume 6519, 65190V (2007) https://doi.org/10.1117/12.712861
KEYWORDS: Line width roughness, Nanoimprint lithography, Diffusion, Electroluminescence, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, Modulation transfer functions, Lithography, Photoresist processing

Proceedings Article | 4 May 2005 Paper
David Van Steenwinckel, Jeroen Lammers, L. H. A. Leunissen, J. A. J. M. Kwinten
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598677
KEYWORDS: Diffusion, Line edge roughness, Electroluminescence, Lithography, Modulation transfer functions, Photoresist processing, Photoresist materials, Chemically amplified resists, Point spread functions, Convolution

Showing 5 of 13 publications
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