Mr. David M. Williamson
NRCA Fellow at Nikon Research Corp of America
SPIE Involvement:
Publications Committee | Fellow status | Conference Program Committee | Symposium Chair | Author | Instructor
Area of Expertise:
Optical Design , Microlithography
Publications (12)

PROCEEDINGS ARTICLE | September 25, 2015
Proc. SPIE. 9626, Optical Systems Design 2015: Optical Design and Engineering VI
KEYWORDS: Mirrors, Optical design, Optical lithography, Wavefront aberrations, Projection systems, Aspheric lenses, Photomasks, Extreme ultraviolet, Semiconducting wafers, Optics manufacturing

PROCEEDINGS ARTICLE | August 3, 2006
Proc. SPIE. 6342, International Optical Design Conference 2006
KEYWORDS: Lithography, Monochromatic aberrations, Optical design, Cameras, Glasses, Computing systems, Wavefronts, Lens design, Zoom lenses, Chemical elements

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Optical design, Metrology, Glasses, Manufacturing, Wavefronts, Lens design, Kinematics, Aspheric lenses, Lens manufacturing

PROCEEDINGS ARTICLE | August 19, 2005
Proc. SPIE. 5874, Current Developments in Lens Design and Optical Engineering VI
KEYWORDS: Lithography, Monochromatic aberrations, Optical design, Reticles, Deep ultraviolet, Projection systems, Semiconducting wafers, Refractor telescopes, Combined lens-mirror systems, Liquids

PROCEEDINGS ARTICLE | September 14, 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Wafer-level optics, Lithography, Reticles, Scanners, Projection systems, Photomasks, Vibration isolation, Semiconducting wafers, 193nm lithography, Combined lens-mirror systems

PROCEEDINGS ARTICLE | November 8, 2000
Proc. SPIE. 4146, Soft X-Ray and EUV Imaging Systems
KEYWORDS: Deep ultraviolet, Imaging systems, X-rays, Ytterbium, Projection systems, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, X-ray imaging, Information operations

Showing 5 of 12 publications
Conference Committee Involvement (7)
Optical Design and Testing VIII
11 October 2018 | Beijing, China
SPIE Optical Systems Design
14 May 2018 | Frankfurt, Germany
Optical Design and Testing VII
12 October 2016 | Beijing, China
SPIE Optical Systems Design
7 September 2015 | Jena, Germany
SPIE Optical Systems Design
26 November 2012 | Barcelona, Spain
Showing 5 of 7 published special sections
Course Instructor
SC115: Microlithographic Optical Design
Microlithographic lenses are used to project an electrical circuit pattern onto the surface of a semiconductor wafer. This course will provide a background in the design and manufacturing issues of such optical projection systems used in photolithography.
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