Dr. David H. Ziger
Corporate Applications Engineer
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Scanners, Silicon, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Semiconductors, Visualization, Metals, Manufacturing, Photomasks, Image enhancement, Semiconductor manufacturing, Mask making, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Visualization, Metals, Error analysis, Inspection, Photomasks, Cadmium sulfide, Optical proximity correction, Critical dimension metrology, Tolerancing

Proceedings Article | 9 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Databases, Matrices, Image processing, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing, Phase shifts

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Reticles, Metrology, Silicon, Photomasks, Computed tomography, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers

Showing 5 of 16 publications
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