Dean K. Yonenaga
Manager Customer Engagement at KLA Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Extreme ultraviolet, Photomasks, Scanning electron microscopy, Inspection, Atomic force microscopy, Double positive medium, Semiconducting wafers, Metrology, Image analysis, Deep ultraviolet

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Inspection, Photomasks, Contamination, Defect detection, Resolution enhancement technologies, Defect inspection, Particles, Image classification, Air contamination, Scanners

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Inspection, Photomasks, Defect detection, Image restoration, Image transmission, Semiconducting wafers, Image processing, Image analysis, Resolution enhancement technologies, Image resolution

Proceedings Article | 16 July 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Scatterometry, Scanning electron microscopy, Semiconducting wafers, Photoresist materials, Scatter measurement, Critical dimension metrology, Process control, Databases, Metrology, Cadmium

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