Dr. Deirdre L. Olynick
at Univ. of California
SPIE Involvement:
Author
Publications (16)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Photons, Molecules, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | October 3, 2016
Proc. SPIE. 9919, Nanophotonic Materials XIII
KEYWORDS: Oxides, Plasmonics, Data modeling, Metals, Spectroscopy, Spectroscopic ellipsometry, Atomic layer deposition, Plasma etching, Plasma, Tin

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Calibration, Chemistry, Atomic force microscopy, Scanning electron microscopy, Scanning probe microscopy, Line edge roughness, Line scan image sensors

SPIE Journal Paper | September 5, 2014
JM3 Vol. 13 Issue 03
KEYWORDS: Nanoimprint lithography, Metals, Multilayers, Etching, Polymethylmethacrylate, Optical lithography, Plasma, Ultraviolet radiation, Silicon films, Scanning electron microscopy

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Calibration, Ions, Silicon, Chemistry, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Extreme ultraviolet lithography, Scanning probe microscopy, Neodymium

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Electron beam lithography, Image processing, Molecules, Image resolution, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Chemically amplified resists

Showing 5 of 16 publications
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