Dekong Zeng
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 25 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Data modeling, Semiconducting wafers, Metrology, Feature selection, Principal component analysis, Plasma etching, Neural networks, Genetics, Genetic algorithms, Etching

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