Dr. Derek Chen
at Nanya Technology Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Fluctuations and noise, Error analysis, Pellicles, Printing, Finite element methods, Photomasks, Lutetium, Critical dimension metrology, Semiconducting wafers

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