Dr. Derren N. Dunn
Advisory Engineers at IBM
SPIE Involvement:
Author
Publications (18)

PROCEEDINGS ARTICLE | September 6, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Calibration, Etching, Metals, Error analysis, Computer simulations, Directed self assembly, Extreme ultraviolet lithography, Critical dimension metrology, Process modeling

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Logic, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Computational lithography, Optical proximity correction, Nanoimprint lithography, Tolerancing, Stochastic processes, Back end of line, Design for manufacturability

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Oxides, Optical lithography, Etching, Image processing, Interfaces, Ions, 3D modeling, Monte Carlo methods, Plasma etching, Chemical elements, Semiconducting wafers, Bromine, Process modeling, Plasma

SPIE Journal Paper | July 19, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Optical calibration, Scanning electron microscopy, Hybrid optics, Metals, Calibration, Instrument modeling, OLE for process control

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Ions, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Metrology, Data modeling, Calibration, Metals, Scanning electron microscopy, Logic devices, Optical proximity correction, Critical dimension metrology, OLE for process control, Instrument modeling

Showing 5 of 18 publications
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