Dr. Derren N. Dunn
Advisory Engineers at IBM Thomas J Watson Research Ctr
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Author
Publications (21)

Proceedings Article | 6 May 2020
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Metrology, Surface plasmons, Optical lithography, Data modeling, Etching, Neural networks, Reactive ion etching, Semiconducting wafers, Stochastic processes, Bayesian inference

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Metals, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, SRAF, Line edge roughness, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Electron beam lithography, Image processing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Line edge roughness, Semiconducting wafers, Stochastic processes

Proceedings Article | 6 September 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Calibration, Etching, Metals, Error analysis, Computer simulations, Directed self assembly, Extreme ultraviolet lithography, Critical dimension metrology, Process modeling

Proceedings Article | 30 March 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Logic, Optical lithography, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Computational lithography, Optical proximity correction, Nanoimprint lithography, Tolerancing, Stochastic processes, Back end of line, Design for manufacturability

Showing 5 of 21 publications
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