Dr. Latifa Desvoivres
R&D Senior Etch Engineer at STMicroelectronics
SPIE Involvement:
Author
Publications (4)

SPIE Journal Paper | April 10, 2015
JM3 Vol. 14 Issue 02
KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9054, Advanced Etch Technology for Nanopatterning III
KEYWORDS: Magnesium, Diffractive optical elements, Etching, Metals, Silicon, Control systems, Transmission electron microscopy, Scatterometry, Capacitance, Semiconducting wafers

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9054, Advanced Etch Technology for Nanopatterning III
KEYWORDS: Lithography, Electron beam lithography, Polymethylmethacrylate, Etching, Metals, Silicon, Chemistry, Photomasks, Picosecond phenomena, System on a chip

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, 3D acquisition, Diffractive optical elements, Etching, Metals, 3D modeling, Transmission electron microscopy, Scatterometry, Critical dimension metrology, Semiconducting wafers

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