Dr. Detlef Melzer
at EQUIcon Software GmbH Jena
SPIE Involvement:
Publications (7)

Proceedings Article | 17 April 2012 Paper
M. Krueger, M. Banasch, R. Galler, D. Melzer, L. Ramos, M. Suelzle, U. Weidenmueller, U. Zeitner
Proceedings Volume 8352, 83520I (2012) https://doi.org/10.1117/12.920568
KEYWORDS: Calibration, Sensors, Photoresist processing, Electron beam lithography, Cadmium, Scanning electron microscopy, Critical dimension metrology, Photomasks, Target detection, Electron beams

Proceedings Article | 14 October 2011 Paper
R. Galler, M. Krueger, D. Melzer, L. Ramos, M. Suelzle, U. Weidenmueller
Proceedings Volume 8166, 81660P (2011) https://doi.org/10.1117/12.896759
KEYWORDS: Calibration, Monte Carlo methods, Electron beam lithography, Lithography, Photoresist processing, Cadmium sulfide, Scattering, Point spread functions, Critical dimension metrology, Semiconductors

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 782309 (2010) https://doi.org/10.1117/12.865708
KEYWORDS: Photomasks, Vestigial sideband modulation, Beam shaping, Metals, Lithography, Electron beam lithography, Optical proximity correction, Source mask optimization, Computational lithography, Integrated optics

Proceedings Article | 15 May 2010 Paper
R. Galler, D. Melzer, M. Boettcher, M. Krueger, M. Suelzle, C. Wagner
Proceedings Volume 7545, 75450F (2010) https://doi.org/10.1117/12.863376
KEYWORDS: Line width roughness, Photoresist processing, Computer simulations, Convolution, Electron beam lithography, Semiconductors, Calibration, Data processing, Data corrections, Laser scattering

Proceedings Article | 23 September 2009 Paper
J. Gramss, R. Galler, V. Neick, A. Stoeckel, U. Weidenmueller, D. Melzer, M. Suelzle, J. Butschke, U. Baetz
Proceedings Volume 7488, 748827 (2009) https://doi.org/10.1117/12.835880
KEYWORDS: Photomasks, Beam shaping, Data conversion, Magnesium, Electron beam lithography, Data processing, Visualization, Standards development, Lithography, Computer architecture

Showing 5 of 7 publications
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