Dr. Detlef Melzer
at EQUIcon Software GmbH Jena
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 17, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Target detection, Electron beam lithography, Electron beams, Cadmium, Sensors, Calibration, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Point spread functions, Scattering, Calibration, Monte Carlo methods, Cadmium sulfide, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Electron beam lithography, Metals, Photomasks, Integrated optics, Beam shaping, Source mask optimization, Computational lithography, Optical proximity correction, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 15, 2010
Proc. SPIE. 7545, 26th European Mask and Lithography Conference
KEYWORDS: Semiconductors, Electron beam lithography, Calibration, Laser scattering, Computer simulations, Data processing, Line width roughness, Convolution, Photoresist processing, Data corrections

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Electron beam lithography, Magnesium, Visualization, Data processing, Photomasks, Beam shaping, Data conversion, Computer architecture, Standards development

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Magnesium, Visualization, Computer simulations, Data processing, Photomasks, Algorithm development, Electron beam direct write lithography

Showing 5 of 7 publications
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