Dr. Dexin Kong
Advisory Metrology Engineer at IBM Research
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 4 May 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Lithography, Metrology, Data modeling, Etching, Photoresist materials, Scatterometry, Machine learning, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 2 April 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: X-ray optics, Metrology, Visualization, Gallium arsenide, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Measurement devices, Semiconducting wafers

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX

Proceedings Article | 2 July 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Copper, Scatterometry, Machine learning

Proceedings Article | 5 September 2018 Presentation + Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Mathematical modeling, Metrology, Data modeling, Scanning electron microscopy, Transmission electron microscopy, Scatterometry, Machine learning, Field effect transistors, Semiconducting wafers, Scatter measurement

Showing 5 of 6 publications
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