Dr. Deyan Wang
Principal Research Scientist at Dow Electronic Materials
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Etching, Dry etching, Polymers, Metals, Silicon, Reflectivity, Chemical vapor deposition, Oxygen, Photoresist materials, Photomasks

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Electron beam lithography, Switches, Scanners, Coating, Photoresist materials, Thin film coatings, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 19 March 2012 Paper
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Electron beam lithography, Polymers, Coating, Photoresist materials, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Photoresist developing

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Electron beam lithography, Polymers, Scanners, Electroluminescence, Photoresist materials, Immersion lithography, Line edge roughness, Thin film coatings, Photoresist developing

Proceedings Article | 31 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Electron beam lithography, Polymers, Water, Surface roughness, Surface properties, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

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