Ms. Diana Convey Profile

Diana Convey

Sr Staff Res Engineer at Motorola Solutions Inc

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Author

Publications (5)

Proceedings Article | 25 October 2006 Paper

Fabrication of a monolithically integrated multiple wavelength Fabry-Perot filter array using transparent etch stop layers for accurate wavelength determination

Ngoc Le, Jeffrey Baker, Paige Holm, Diana Convey, Steven Smith

Proceedings Volume 6378, 637815 (2006) https://doi.org/10.1117/12.684937

KEYWORDS: Etching, Fabry–Perot interferometers, Oxides, Mirrors, Reflectivity, Silicon, Dielectric filters, Optical filters, Digital filtering, Chromium

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Proceedings Article | 20 May 2004 Paper

Mesoscale modeling for SFIL simulating polymerization kinetics and densification

Diana Convey, C. Grant Willson, Peter Fejes, Douglas Resnick, Yi Wei, William Dauksher, Kathleen Gehoski, Eui Kim, Sean Burns, Kevin Nordquist, Jason Meiring, Nicholas Stacey, Stephen Johnson, Ryan Burns, David Mancini, Gerard Schmid, Michael Dickey

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536216

KEYWORDS: Etching, Polymerization, Molecules, Monte Carlo methods, Finite element methods, Lithography, Ultraviolet radiation, Molecular interactions, Scanning electron microscopy, Optical lithography

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Proceedings Article | 27 December 2002 Paper

Recovery of Mo/Si-multilayer-coated LTEM substrate

James Wasson, A. Alec Talin, Diana Convey, Sang-In Han, Andrew Hooper, Pawitter Mangat

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468106

KEYWORDS: Etching, Molybdenum, Surface roughness, Photomasks, Silicon, Multilayers, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Annealing

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Proceedings Article | 23 October 2002 Paper

Effect of annealing tmeperature on physical properties of thin epitaxial PZT films on STO/Si substrates

A. Talin, Andy Hooper, Steven Smith, Steven Voight, Diana Convey

Proceedings Volume 4804, (2002) https://doi.org/10.1117/12.453551

KEYWORDS: Ferroelectric materials, Crystals, Silicon, Annealing, Sol-gels, Thin films, Scanning electron microscopy, Surface roughness, Refractive index, Perovskite

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Proceedings Article | 11 March 2002 Paper

Thin film stress control of absorber stack materials for EUVL reticles

Lubomir Parobek, Pawitter Mangat, Diana Convey, James Wasson, D. Frank Bazzarre

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458257

KEYWORDS: Thin films, Resistance, Chromium, Extreme ultraviolet lithography, Distortion, Spectroscopic ellipsometry, Absorption, Photomasks, X-rays, Semiconducting wafers

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