Diana Convey
Sr Staff Res Engineer at Motorola Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 25 October 2006
Proc. SPIE. 6378, Chemical and Biological Sensors for Industrial and Environmental Monitoring II
KEYWORDS: Oxides, Optical filters, Mirrors, Fabry–Perot interferometers, Etching, Digital filtering, Silicon, Reflectivity, Chromium, Dielectric filters

Proceedings Article | 20 May 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Etching, Ultraviolet radiation, Molecules, Scanning electron microscopy, Monte Carlo methods, Finite element methods, Polymerization, Molecular interactions

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Multilayers, Etching, Annealing, Silicon, Reflectivity, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum

Proceedings Article | 23 October 2002
Proc. SPIE. 4804, Sol-Gel Optics VI
KEYWORDS: Thin films, Refractive index, Ferroelectric materials, Annealing, Crystals, Silicon, Surface roughness, Scanning electron microscopy, Sol-gels, Perovskite

Proceedings Article | 11 March 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Thin films, X-rays, Resistance, Chromium, Distortion, Spectroscopic ellipsometry, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

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