Ms. Dianna Coburn Profile

Dianna Coburn

Corp Tapeout Reticle Manager at Cypress Semiconductor Corp

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 30 October 2007 Paper

Mask manufacturability improvement by MRC

A. Balasinski, D. Coburn, P. Buck

Proceedings Volume 6730, 67303J (2007) https://doi.org/10.1117/12.746188

KEYWORDS: Photomasks, Inspection, Computer aided design, Manufacturing, Error analysis, Optical proximity correction, Databases, Metrology, Semiconducting wafers, Control systems

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Conversion from 50 KeV to DUV mask writer for 90-nm technology critical layers

Dongsung Hong, Prakash Krishnan, Dianna Coburn, Mary Zawadzki, Yonghong Yang, Kent Green, Peter Buck, Curt Jackson, Larry Martinez

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535882

KEYWORDS: Photomasks, Deep ultraviolet, Semiconducting wafers, Optical proximity correction, Lithography, Electron beam lithography, Error control coding, Metals, Laser systems engineering, Binary data

Read Abstract +

One of Cypress’ primary goals for 90-nm generation mask strategy is to control mask costs while not compromising on performance. One key objective is to replace the use of 50-ke V electron beam pattern generation with DUV laser mask lithography where possible. The higher productivity of the DUV laser systems compared to the 50Ke V e-beam platforms offers a unique opportunity for mask cost reduction. Compared to previous i-line generations of laser lithography systems, the DUV laser systems provide significantly improved resolution and pattern fidelity that more closely approaches that of ebeam lithography. We have previously published experimental results demonstrating that the difference in fidelity on the mask between the laser and EB platforms does not always translate to a measurable difference in wafer litho performance or even more importantly to a measurable difference in electrical performance. Through this work, Cypress was able to eliminate the use of 50Ke V ebeam writers for all of their 130nm technology node layers. In some cases the improved performance of the DUV tools was sufficient to replace i-line produced masks where wafer performance was marginal without having to resort to EB lithography. This study addresses the conversion of 50Ke V ebeam layers to DUV laser platform specifically for the critical layers of the Cypress’ 90nm Technology node. EB lithography was originally specified for these layers as a conservative approach in part due to the timing of 90-nm technology development relative to the maturation of the DUV laser mask lithography process. In this study, the electrical performance and wafer yield are evaluated for equivalency in order to take advantage of the lower cost and faster cycletime that use of a ALTA DUV system provides over the 50Ke V VSB systems. In addition, the wafer OPC is not changed between the two mask writing systems in order to allow interchangeable use of the two writing systems if the experimental results indicated no difference in wafer performance.

Proceedings Article | 17 December 2003 Paper

DUV mask writer for BEOL 90-nm technology layers

Dongsung Hong, Prakash Krishnan, Dianna Coburn, Nazneen Jeewakhan, Shengqi Xie, Joshua Broussard, Bradley Ferguson, Kent Green, Peter Buck, Curt Jackson, Larry Martinez

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518051

KEYWORDS: Photomasks, Deep ultraviolet, Semiconducting wafers, Metals, Vestigial sideband modulation, Reticles, Optical proximity correction, Back end of line, Critical dimension metrology, Cadmium

Read Abstract +

Proceedings Article | 17 December 2003 Paper

193-nm haze contamination: a close relationship between mask and its environment

Eric Johnstone, Laurent Dieu, Christian Chovino, Julio Reyes, Dongsung Hong, Prakash Krishnan, Dianna Coburn, Christian Capella

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518262

KEYWORDS: Photomasks, Air contamination, Contamination, Pellicles, Reticles, Binary data, Glasses, Chemistry, Inspection, Environmental sensing

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Reticle defect printability: impact on yield and feedback to suppliers

Robert Vinje, Arthur Klaum, David Chmielewski, Matt Lamantia, Dawn Woolery, Dianna Coburn, Colleen Weins

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468087

KEYWORDS: Reticles, Inspection, Semiconducting wafers, Manufacturing, Defect detection, Semiconductors, Photomasks, Defect inspection, Etching, Wafer inspection

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Advanced write tool effects on 100-nm node OPC

Peter Buck, Kent Green, Kent Ibsen, Kent Nakagawa, Dongsung Hong, Prakash Krishnan, Dianna Coburn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467761

KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Deep ultraviolet, Image processing, Electron beam lithography, Printing, Scanning electron microscopy, Manufacturing

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years