Dianna Coburn
Corp Tapeout Reticle Manager at Cypress Semiconductor Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Databases, Error analysis, Manufacturing, Inspection, Control systems, Photomasks, Optical proximity correction, Computer aided design, Semiconducting wafers

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Electron beam lithography, Deep ultraviolet, Metals, Photomasks, Optical proximity correction, Error control coding, Semiconducting wafers, Binary data, Laser systems engineering

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Cadmium, Deep ultraviolet, Metals, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Vestigial sideband modulation, Back end of line

Proceedings Article | 17 December 2003 Paper
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Contamination, Air contamination, Glasses, Chemistry, Inspection, Pellicles, Photomasks, Environmental sensing, Binary data

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Deep ultraviolet, Image processing, Manufacturing, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, Semiconducting wafers

Showing 5 of 6 publications
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