Dr. Dick Verkleij
at FEI Electron Optics BV
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Sensors, Scanners, Control systems, Time metrology, Neural networks, Machine learning, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Materials processing, Manufacturing, Photomasks, Double patterning technology, Immersion lithography, Algorithm development

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Contamination, Particles, Silicon, Inspection, Nondestructive evaluation, Platinum, Scanning electron microscopy, Transmission electron microscopy, Semiconducting wafers, Gallium

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