Dr. Diederik J. Maas
Sr. scientist / systems engineer at TNO
SPIE Involvement:
Area of Expertise:
Charged Particle Optics , Scanning Electron Microscopy , Scanning Helium ion Microscopy , Nano-imaging and -fabrication , Metrology
Profile Summary

Dr. D.J. Maas is presently Senior Systems Architect with TNO Science and Industry. From 1998-2006 he was Senior Scientist at Philips Research, where he developed an Electrostatic Aberration Corrector for LV-SEM.
He has obtained is PhD degree from the University of Amsterdam for work that was performed at AMOLF involving coherent control of atomic and molecular excitations using chirped ultrashort infrared laser pulses.
His undergraduate work involved experimental studies of the fractional quantum Hall effect on quantum dots that he made using electron beam lithography (See front cover Physics Today March 2002).
Publications (13)

Proceedings Article | 13 June 2022 Presentation
Maarten van Es, Mehmet Selman Tamer, Robbert Bloem, Elfi van Zeijl, Jacques C. Verdonck, Adam Chuang, Diederik Maas
Proceedings Volume PC12055, PC1205504 (2022) https://doi.org/10.1117/12.2614293
KEYWORDS: Metrology, Spatial resolution, Semiconductor manufacturing, Photoresist materials, Photonic microstructures, Microscopy, Lithography, Inspection, Electron beams, Electron beam lithography

Proceedings Article | 13 March 2018 Paper
Peter van der Walle, Esther Kramer, Rob Ebeling, Helma Spruit, Paul Alkemade, Silvania Pereira, Jacques van der Donck, Diederik Maas
Proceedings Volume 10585, 105852D (2018) https://doi.org/10.1117/12.2297188
KEYWORDS: Particles, Scattering, Scatterometry, Defect detection, Scanning electron microscopy, Scanners, Signal detection, Optical metrology, Semiconducting wafers

Proceedings Article | 26 June 2017 Paper
P. van der Walle, E. Kramer, J. C. van der Donck, W. Mulckhuyse, L. Nijsten, F. Bernal Arango, A. de Jong, E. van Zeijl, H. E. Spruit, J. van den Berg, G. Nanda, A. van Langen-Suurling, P. F. Alkemade, S. Pereira, D. Maas
Proceedings Volume 10329, 103294N (2017) https://doi.org/10.1117/12.2272414
KEYWORDS: Metrology, Manufacturing, Scanners, Latex, Optical spheres, Particles, Semiconducting wafers, Scanning electron microscopy, Signal detection, Speckle, Wafer-level optics, Silicon, Reticles, Inspection, Defect detection, Atomic force microscopy, Contamination control, Defect inspection, Optical microscopy, Particle contamination

Proceedings Article | 28 March 2017 Paper
Diederik Maas, Pim Muilwijk, Michel van Putten, Frank de Graaf, Olaf Kievit, Patrique Boerboom, Norbert Koster
Proceedings Volume 10145, 101452I (2017) https://doi.org/10.1117/12.2258230
KEYWORDS: Sensors, Molecules, Process control, Contamination, Manufacturing, Extreme ultraviolet, Carbon, Yield improvement, Vacuum equipment, Vacuum deposition, Ions, Xenon, Semiconducting wafers, Scanning electron microscopy, Krypton, Semiconductor manufacturing

Proceedings Article | 4 April 2016 Paper
Jacqueline van Veldhoven, Timo Huijser, Evert Nieuwkoop, Michel van Putten, Norbert Koster, Diederik Maas
Proceedings Volume 9776, 97762T (2016) https://doi.org/10.1117/12.2235100
KEYWORDS: Extreme ultraviolet, Sensors, Extreme ultraviolet lithography, Xenon, Carbon, Photons, Neodymium, Electron beam lithography, Ultraviolet radiation, Plasma

Showing 5 of 13 publications
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