Dr. Dieter Van den Heuvel
Process Engineer at imec
SPIE Involvement:
Author
Publications (42)

Proceedings Article | 24 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Actuators, Lithography, Optical lithography, Etching, Scanning electron microscopy, Process control, Plasma etching, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | 10 October 2019
JM3 Vol. 18 Issue 04
KEYWORDS: Overlay metrology, Semiconducting wafers, Metals, Etching, Scanners, Optical filters, Extreme ultraviolet lithography, Data modeling, Metrology, Scanning electron microscopy

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Modulation, Inspection, Optical inspection, Bridges, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Wafer-level optics, Optical filters, Metrology, Etching, Metals, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 23 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Etching, Metals, Copper, Resistance, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Tin

Showing 5 of 42 publications
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