Dilip Patel
Defect Metrology Manager
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Semiconducting wafers, Image processing, Copper, Microscopy, Scanning electron microscopy, Safety, Semiconductors, Chemical mechanical planarization, Etching, Neodymium

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Polarization, Defect detection, Defect inspection, Finite-difference time-domain method, Neodymium, Metrology, Semiconducting wafers, Illumination engineering, 3D modeling, Wafer-level optics

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Inspection, Semiconducting wafers, Metrology, Scanning electron microscopy, Process control, Optical lithography, Integrated circuits, Integrated circuit design, Manufacturing, Defect detection

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Overlay metrology, Inspection, Semiconducting wafers, Process control, Yield improvement, Critical dimension metrology, Optical proximity correction, Etching, Lithography

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Defect detection, Semiconducting wafers, Inspection, Scanning electron microscopy, Target recognition, Metrology, Manufacturing, Wafer inspection, Particles, Chemical analysis

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