Dimitry Sanko
at KLA Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Data modeling, Etching, Scanners, Control systems, Scatterometry, Optical metrology, Time metrology, Signal processing, Measurement devices, Transistors, Critical dimension metrology, Semiconducting wafers, Model-based design, Instrument modeling

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Metrology, Data modeling, Scanners, Scatterometry, Finite element methods, Critical dimension metrology, Semiconducting wafers, Model-based design, Single crystal X-ray diffraction

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