Dion King
at Grace Semiconductor Manufacturing Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 21 November 2007
Proc. SPIE. 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography
KEYWORDS: Metrology, Data modeling, Calibration, Scanning electron microscopy, Time metrology, Optical proximity correction, Critical dimension metrology, Statistical modeling, Systems modeling, Model-based design

Proceedings Article | 14 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Data modeling, Calibration, Databases, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Performance modeling

Proceedings Article | 9 June 2006
Proc. SPIE. 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
KEYWORDS: Reticles, Data modeling, Inspection, Data processing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Process modeling

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Data modeling, Manufacturing, Data processing, Signal processing, Process control, Neural networks, Erbium, Performance modeling, Overlay metrology, Instrument modeling

Proceedings Article | 14 March 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Semiconductors, Oxides, Lithography, Optical lithography, Manufacturing, Resistance, Scanning electron microscopy, Photomasks, Optical proximity correction, Process modeling

Showing 5 of 6 publications
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