Dr. Dirk Hellweg
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (20)

PROCEEDINGS ARTICLE | October 23, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Metrology, Image processing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, 3D image processing, 193nm lithography

SPIE Journal Paper | September 17, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line width roughness, Photomasks, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Stochastic processes, Speckle, Scanners, Extreme ultraviolet lithography, Metrology

PROCEEDINGS ARTICLE | March 27, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Speckle, Image processing, Scanners, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Metrology, Image processing, Scanners, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Lithography, Scanners, Manufacturing, 3D metrology, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Inspection, Chromium, Atomic force microscopy, Scanning electron microscopy, Printing, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 20 publications
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