Dr. Dirk Zeidler
Principal Scientist / Program Manager at Carl Zeiss Microscopy GmbH
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Publications (11)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Semiconductors, Electron beams, Sensors, Electron microscopes, Scanning electron microscopy, Electron microscopy

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Optical lithography, Imaging systems, Sensors, Inspection, Electron microscopes, Scanning electron microscopy, Image quality, Critical dimension metrology, Defect inspection

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Electron beam lithography, Electron beams, Sensors, Metals, Image processing, Electrons, Inspection, Scanning electron microscopy, Wafer inspection, Semiconducting wafers, Tin, Defect inspection

Proceedings Article | 4 September 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Imaging systems, Inspection, Optical inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Semiconducting wafers, Optics manufacturing, Defect inspection

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Electron beams, Sensors, Inspection, Image acquisition, Image resolution, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Semiconducting wafers, Defect inspection

Showing 5 of 11 publications
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