Dmitri Lapanik
Senior CAD Engineer
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Wafer-level optics, Scattering, Metals, Error analysis, Design for manufacturing, Transistors, Optical proximity correction, Algorithm development, Semiconducting wafers, Systems modeling

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Calibration, Image processing, Manufacturing, Photomasks, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Systems modeling, Process modeling, Resolution enhancement technologies

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top