Dr. Dmitriy V. Gorelikov
Senior Scientist at Nanometrics Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Electron beam lithography, Metrology, 3D acquisition, Silicon, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Oxides, Metrology, Image processing, Computer simulations, Scanning electron microscopy, Monte Carlo methods, Wafer inspection, Cadmium sulfide, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Databases, Silicon, Scanning electron microscopy, Scatterometry, Monte Carlo methods, 3D metrology, Optical simulations, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Metrology, Calibration, Computer simulations, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, Monte Carlo methods, Integrated circuits, Critical dimension metrology, Semiconducting wafers

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