Mr. Dmitriy Shneyder
at
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Metrology, Calibration, Manufacturing, Atomic force microscopy, Scatterometry, Time metrology, Process control, Semiconducting wafers, Overlay metrology, New and emerging technologies

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Etching, Error analysis, Composites, Atomic force microscopy, Optical testing, Scatterometry, Atomic force microscope, Critical dimension metrology, Semiconducting wafers

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