Dmitry Shur
at KLA Israel
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Etching, Dielectrics, Electrons, Silicon, Scanning electron microscopy, Process control, Photomasks, Cadmium sulfide, Critical dimension metrology, Semiconducting wafers

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