Mr. Dmitry A. Vengertsev
Data Scientist, R&D at Micron Technology Inc
Publications (3)

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Image segmentation, Manufacturing, Inspection, Scanning electron microscopy, Frequency modulation, Photomasks, Extreme ultraviolet, Fermium, Image classification, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Electron beams, Error analysis, Monte Carlo methods, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Principal component analysis, Data modeling, Calibration, Logic devices, Optical proximity correction, Semiconducting wafers, Optics manufacturing, Statistical modeling, Model-based design

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top