Dr. Do Young Kim Profile

Dr. Do Young Kim

Implementation of Reflected Light Die-To at SAMSUNG Electronics Co Ltd

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Author

Publications (4)

Proceedings Article | 20 October 2006 Paper

EUV mask pattern inspection for memory mask fabrication in 45-nm node and below

Do Young Kim, Seong Yong Cho, Hun Kim, Sung Min Huh, Dong Hoon Chung, Byung Chul Cha, Jung Woo Lee, Seong Woon Choi, Woo Sung Han, Ki Hun Park, Eun Ji Kim, Zhengyu Guo, Ellen Quach, David Gee, Tom Brown, Aditya Dayal

Proceedings Volume 6349, 63492L (2006) https://doi.org/10.1117/12.686488

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, EUV optics, Extreme ultraviolet lithography, Deep ultraviolet, Reticles, Defect detection, Binary data, Current controlled current source

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Proceedings Article | 4 November 2005 Paper

Implementation of reflected light die-to-die inspection and ReviewSmart to improve 65nm DRAM mask fabrication

Do Young Kim, Won Il Cho, Jin Hyung Park, Dong Hoon Chung, Byung Chul Cha, Seong Woon Choi, Woo Sung Han, Ki Hun Park, Nam Wook Kim, Carl Hess, Weimin Ma, David Kim

Proceedings Volume 5992, 599209 (2005) https://doi.org/10.1117/12.632338

KEYWORDS: Inspection, Defect detection, Photomasks, Contamination, Binary data, Defect inspection, Nanoimprint lithography, Deep ultraviolet, Semiconducting wafers, Mask making

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Proceedings Article | 14 May 2004 Paper

Analysis of solvent effect to control the BARC coating uniformity

Min-Ho Jung, Sangwoong Yoon, Eun-Soon Chung, Beom-Sang Yoo, Jeong Yun Ya, Don Winning, Boo Deuk Kim, Hong Lee, Do Young Kim, Young Hoon Kim, Myungsun Kim, Young Ho Kim, Sang-Mun Chon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533924

KEYWORDS: Coating, Humidity, Polymers, Statistical modeling, Control systems, Reflectivity, Photoresist materials, Manufacturing, Chemistry, Inspection

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Proceedings Article | 14 May 2004 Paper

Influence of resin properties to resist performance at ArF lithography

Sangwoong Yoon, Myungsun Kim, Hong Lee, Do Kim, Young Hoon Kim, Boo Deuk Kim, Jae Hyun Kim, Kyung-Mee Kim, Shi Yong Lee, Young Ho Kim, Sang-Mun Chon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533950

KEYWORDS: Line edge roughness, Lithography, Palladium, Polymers, Ultraviolet radiation, Polymerization, Manganese, Photoresist materials, Sensors, Critical dimension metrology

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