Dr. Do Young Kim
Implementation of Reflected Light Die-To at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (4)

Proceedings Article | 20 October 2006 Paper
Do Young Kim, Seong Yong Cho, Hun Kim, Sung Min Huh, Dong Hoon Chung, Byung Chul Cha, Jung Woo Lee, Seong Woon Choi, Woo Sung Han, Ki Hun Park, Eun Ji Kim, Zhengyu Guo, Ellen Quach, David Gee, Tom Brown, Aditya Dayal
Proceedings Volume 6349, 63492L (2006) https://doi.org/10.1117/12.686488
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, EUV optics, Extreme ultraviolet lithography, Deep ultraviolet, Reticles, Defect detection, Binary data, Current controlled current source

Proceedings Article | 4 November 2005 Paper
Proceedings Volume 5992, 599209 (2005) https://doi.org/10.1117/12.632338
KEYWORDS: Inspection, Defect detection, Photomasks, Contamination, Binary data, Defect inspection, Nanoimprint lithography, Deep ultraviolet, Semiconducting wafers, Mask making

Proceedings Article | 14 May 2004 Paper
Min-Ho Jung, Sangwoong Yoon, Eun-Soon Chung, Beom-Sang Yoo, Jeong Yun Ya, Don Winning, Boo Deuk Kim, Hong Lee, Do Young Kim, Young Hoon Kim, Myungsun Kim, Young Ho Kim, Sang-Mun Chon
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533924
KEYWORDS: Coating, Humidity, Polymers, Statistical modeling, Control systems, Reflectivity, Photoresist materials, Manufacturing, Chemistry, Inspection

Proceedings Article | 14 May 2004 Paper
Sangwoong Yoon, Myungsun Kim, Hong Lee, Do Kim, Young Hoon Kim, Boo Deuk Kim, Jae Hyun Kim, Kyung-Mee Kim, Shi Yong Lee, Young Ho Kim, Sang-Mun Chon
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533950
KEYWORDS: Line edge roughness, Lithography, Palladium, Polymers, Ultraviolet radiation, Polymerization, Manganese, Photoresist materials, Sensors, Critical dimension metrology

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