Dr. Do Young Kim
Implementation of Reflected Light Die-To at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Reticles, Defect detection, Deep ultraviolet, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Binary data, EUV optics, Current controlled current source

Proceedings Article | 4 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Contamination, Defect detection, Deep ultraviolet, Inspection, Photomasks, Mask making, Nanoimprint lithography, Semiconducting wafers, Binary data, Defect inspection

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Sensors, Polymers, Ultraviolet radiation, Photoresist materials, Polymerization, Palladium, Manganese, Critical dimension metrology, Line edge roughness

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Polymers, Coating, Chemistry, Manufacturing, Inspection, Reflectivity, Control systems, Photoresist materials, Humidity, Statistical modeling

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