Domingo Morales
at Synopsys Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Detection and tracking algorithms, Manufacturing, Distance measurement, Design for manufacturing, Computed tomography, Optical proximity correction, Data conversion, Algorithm development, Tolerancing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Databases, Manufacturing, Inspection, Data processing, Explosives, Data conversion, Neodymium, Photomask technology, Polonium, Current controlled current source

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Data processing, Photomasks, Computed tomography, Associative arrays, Lanthanum, Beryllium, Product engineering, Standards development, Current controlled current source

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Etching, Robotics, Robots, Photomasks, Chlorine, Algorithm development, Photomask technology, Electronic design automation, Prototyping, Current controlled current source

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