Dr. Dominic J. Gnieser
at Physikalisch-Technische Bundesanstalt
SPIE Involvement:
Publications (7)

Proceedings Article | 3 April 2010 Paper
Proceedings Volume 7637, 76371T (2010) https://doi.org/10.1117/12.846517
KEYWORDS: Reflection, Silicon, Teeth, Monte Carlo methods, Semiconducting wafers, Electron beams, Sensors, Objectives, Lithography, Critical dimension metrology

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 76381O (2010) https://doi.org/10.1117/12.846543
KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Chromium, 3D modeling, Sensors, Silica, Scattering, Image acquisition, Electron beams, Photomasks

Proceedings Article | 27 May 2009 Paper
C. Frase, D. Gnieser, K.-P. Johnsen, W. Häßler-Grohne, R. Tutsch, H. Bosse
Proceedings Volume 7470, 74700M (2009) https://doi.org/10.1117/12.835184
KEYWORDS: Monte Carlo methods, Scanning electron microscopy, Photomasks, Scattering, 3D modeling, Semiconducting wafers, Metrology, Optical simulations, Electron beams, Sensors

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72712O (2009) https://doi.org/10.1117/12.814156
KEYWORDS: Sensors, Signal to noise ratio, Monte Carlo methods, Signal detection, Lithography, Etching, Scattering, Electron beams, Direct write lithography, Vestigial sideband modulation

Proceedings Article | 2 May 2008 Paper
W. Häßler-Grohne, C. Frase, D. Gnieser, H. Bosse, J. Richter, A. Wiswesser
Proceedings Volume 6792, 67920O (2008) https://doi.org/10.1117/12.798783
KEYWORDS: Photomasks, Scanning electron microscopy, Critical dimension metrology, Electrons, Monte Carlo methods, Calibration, Metrology, Silicon, Diffusion, Line edge roughness

Showing 5 of 7 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top