Dr. Dominik Metzler
Advisory Engineer at IBM Research
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Optical lithography, Etching, Interfaces, Photoresist materials, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Stochastic processes, Photoresist developing

Proceedings Article | 9 April 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Optical lithography, Etching, Extreme ultraviolet, Line width roughness, Plasma etching, Extreme ultraviolet lithography, Deposition processes, Line edge roughness, Photoresist processing, Plasma

Proceedings Article | 9 April 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Optical lithography, Etching, Polymers, Dielectrics, Chemistry, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

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