Donald J. Samuels
Retired at
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 23 October 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Optical lithography, Data modeling, Printing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Performance modeling, Resolution enhancement technologies

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Optical lithography, Etching, Manufacturing, Computer simulations, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers, Tolerancing, Process modeling

Proceedings Article | 4 March 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Optimization (mathematics), Model-based design, Process modeling, Phase shifts, Design for manufacturability

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Optical lithography, Manufacturing, Inspection, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Chemical elements, Semiconducting wafers

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Metrology, Opacity, Error analysis, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Logic, Scanning electron microscopy, Transmission electron microscopy, Printing, Line width roughness, Transistors, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 18 publications
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