Dr. Donald K. Smith
President at Energetiq Technology Inc
SPIE Involvement:
Author
Publications (10)

SPIE Journal Paper | May 21, 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Extreme ultraviolet, Plasma, Light sources, Photomasks, Metrology, Inspection, Modulators, Xenon, Extreme ultraviolet lithography, Magnetism

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Light sources, Data modeling, Inspection, Physics, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Light sources, Metrology, Copper, Inspection, Magnetism, Modulators, Xenon, Photomasks, Extreme ultraviolet, Plasma

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Light sources, Metrology, Switches, Modulators, Xenon, Diodes, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Chaos

PROCEEDINGS ARTICLE | April 28, 2010
Proc. SPIE. 7680, Next-Generation Spectroscopic Technologies III
KEYWORDS: Infrared imaging, Electrodes, Ultraviolet radiation, Lamps, Physics, Semiconductor lasers, Xenon, Vacuum ultraviolet, Laser optics, Plasma

PROCEEDINGS ARTICLE | March 18, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Light sources, Metrology, Electrodes, Copper, Reliability, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma

Showing 5 of 10 publications
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