Dr. Donald W. Sweeney
LSST Project Manager at LSST
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (21)

PROCEEDINGS ARTICLE | August 4, 2010
Proc. SPIE. 7733, Ground-based and Airborne Telescopes III
KEYWORDS: Telescopes, Optical filters, Mirrors, Cameras, Sensors, Control systems, Data archive systems, Optical instrument design, Large Synoptic Survey Telescope, Prototyping

PROCEEDINGS ARTICLE | August 4, 2010
Proc. SPIE. 7738, Modeling, Systems Engineering, and Project Management for Astronomy IV
KEYWORDS: Observatories, Telescopes, Mirrors, Cameras, Databases, Computing systems, Control systems, Associative arrays, Data centers, Large Synoptic Survey Telescope

PROCEEDINGS ARTICLE | June 23, 2006
Proc. SPIE. 6267, Ground-based and Airborne Telescopes
KEYWORDS: Optical components, Observatories, Telescopes, Optical filters, Mirrors, Imaging systems, Cameras, Data archive systems, Galactic astronomy, Large Synoptic Survey Telescope

PROCEEDINGS ARTICLE | September 28, 2004
Proc. SPIE. 5489, Ground-based Telescopes
KEYWORDS: Telescopes, Optical filters, Mirrors, Astronomy, Stars, Imaging systems, Cameras, Solar system, Optical instrument design, Large Synoptic Survey Telescope

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Carbon, Multilayers, Silicon, Reflectivity, Ion beams, Photomasks, Extreme ultraviolet lithography, Silicon carbide, Critical dimension metrology, Yield improvement

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Multilayers, Optical spheres, Particles, Ions, Coating, Ion beams, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Atmospheric particles

Showing 5 of 21 publications
Conference Committee Involvement (9)
Modeling, Systems Engineering, and Project Management for Astronomy V
1 July 2012 | Amsterdam, Netherlands
Ground-based and Airborne Telescopes IV
1 July 2012 | Amsterdam, Netherlands
Modeling, Systems Engineering, and Project Management for Astronomy IV
27 June 2010 | San Diego, California, United States
Ground-based and Airborne Telescopes III
27 June 2010 | San Diego, California, United States
Modeling, Systems Engineering, and Project Management for Astronomy
26 June 2008 | Marseille, France
Showing 5 of 9 published special sections
Course Instructor
SC123: Introduction to Extreme Ultraviolet Lithography
Extreme Ultraviolet Lithography (EUVL) is the next step for optical lithography moving toward shorter wavelengths. EUVL is a leading technology for device fabrication with feature sizes of 70 nm and below, and is being developed in the U.S., Japan and Europe. The implementation of EUV requires new technologies in sources, optics and resists materials, different from those of the more traditional optical techniques. The course introduces EUVL and the status of developments in the US and worldwide. It focuses on practical issues associated with the design and use of an EUVL stepper. The instructors address the details of the materials and optics, discuss the image formation process, the resist properties, mask design and fabrication, and the current design of lithographic tools.
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