Dong Chul Seo
Research Director at Korea Kumho Petrochemical Co Ltd
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Polymers, Diffusion, Electroluminescence, Scanning electron microscopy, Extreme ultraviolet, Line width roughness, Palladium, Extreme ultraviolet lithography, Polymer thin films

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Electron beam lithography, Light sources, Polymers, Diffusion, Oxygen, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Polymers, Silicon, Diffusion, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Edge roughness

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Etching, Polymers, Glasses, Diffusion, Photoresist materials, Polymerization, Extreme ultraviolet, Sodium, Line edge roughness

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Monochromatic aberrations, Etching, Polymers, Glasses, Resistance, Photoresist materials, Transmittance, Polymerization, Line width roughness

Showing 5 of 15 publications
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